Archive News Story
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Software facilitates analysis of HRXRD data.
August 10, 2005 - RADS v4.0 analyzes high-resolution X-ray diffraction (HRXRD) data from epitaxial structures and single crystal substrates. Along with data-fitting technology, software includes GUI, seamless integration with Bede control and DAQ software, and ability to save results in a statistical process control database. Users can create model structures using spreadsheet-style list of film layers, and software allows linking of multiple layer parameters in models.
Archive Press Release
(Products mentioned in this Archive Press Release may or may not be available from the manufacturer.)
Release date: August 5, 2005
Bede Releases New RADS 4.0 Software
DURHAM, UK – Bede announces the release of RADS 4.0, a Windows®-based software for the analysis of high-resolution X-ray diffraction (HRXRD) data from epitaxial structures and single crystal substrates. RADS 4.0 features Bede’s patented data-fitting technology and includes a number of new or enhanced capabilities, most notably an improved graphical user interface (GUI), seamless integration with Bede’s control and data-acquisition software, and ability to save results in a statistical process control (SPC) database.
The software has been developed over the past 10 years and the latest release further enhances the analytical capabilities of BedeMetrix™ thin-film X-ray metrology tools. These fully automated tools are used to develop and monitor advanced semiconductor materials and manufacturing processes. RADS 4.0 gives users the ability to easily create model structures using a convenient spreadsheet-style list of film layers, including superlattices. The software allows users to link multiple layer parameters in the models as well, giving users the ability to express the thickness, composition, or strain of one layer in terms of another layer in the structure.
The software also offers other advanced features, including presentation quality graphics, a built-in materials database containing the most important semiconductor materials, a batch processing capability and an integrated macro language that can be used to automate and customize the operation of the software.
The BedeMetrix™ family of X-ray metrology tools consists of the BedeMetrix™-L process development tool and the BedeMetrix™-F tools for dedicated process control. The BedeMetrix™-F is available in three primary configurations for strained silicon, metal film structure determination, and high speed thickness measurement.
Bede is the global leader in non-destructive X-ray metrology tools for the semiconductor industry.
Bede was founded in 1978 and is headquartered in Durham, UK. The company has sales and service offices in Denver, Colorado (USA) and Shanghai, China, as well as a global network of distributors. In Prague, Czech Republic, Reflex sro operates as a subsidiary of Bede and provides specialist X-ray technology to the Bede Group.
Contacts:
Public Relations:
Ward Hill Marketing, Inc.
Dan Esdale Program Manager
360 Merrimack Street, Bldg. 5, 3rd Floor
Lawrence MA 01843
United Kingdom
Phone: 978-794-5441
FAX: 978-688-8418 E-mail this person Company Information: Name: Bede Address: Belmont Business Park City: Durham ZIP: DH1 1TW Country: United Kingdom Phone: +44 (0) 191-332-4700 FAX: +44 (0) 191-332-4800 http://www.bede.com
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