Dry Screw Vacuum Pumps handle large gas volumes.

Edwards Vacuum Technology    Wilmington, MA 01887
Feb 07, 2012 With ultimate vacuum typically down to 3.8 x 10^-4 Torr without purge, Models GXS450 and GXS750 deliver peak pumping speeds up to 435 cfm. When combined with booster pump, units offer speeds up to 1,978 cfm. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, which removes need to partially strip pump. Fitted with controller as standard, pumps are suited for steel degassing and metallurgy processes, glass coating, solar coating, and LED manufacture.

Dry Vacuum Pumps feature tapered screw technology.

Edwards Vacuum Technology    Wilmington, MA 01887
Oct 21, 2011 Suited for liquid and solids handling in chemical, petrochemical, and pharmaceutical processes, CXS Pumps offer vacuum down to 10^-3 mbar with no contamination of process stream or cooling water and no effluent generation. Tapered screw technology gives smooth, gradual compression along length of rotor for optimized pumping at all inlet pressures. Independently certified for hazardous environments, units can pump up to 1 L of liquid/min continuously and up to 25 L slugs without stopping.

Dry Screw Vacuum Pumps are virtually maintenance-free.

Edwards Vacuum Technology    Wilmington, MA 01887
Jul 07, 2010 Providing vacuum down to 1 x 10^-3 mbar, GXS Series features service life up to 5 years, even in harsh applications. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, eliminating need to partially strip pump. Shafts are supported at both ends, resulting in optimized dust handling, minimized vibration, and noise levels below 64 dB(A). Applications include lamination, coating, metallurgy, pharmaceutical and food process freeze drying, and packaging.

Exhaust Management Systems use vacuum and abatement technologies.

Edwards Vacuum Technology    Wilmington, MA 01887
Mar 19, 2010 Incorporating iXH harsh process vacuum pump and Atlas(TM) gas abatement solutions, Zenith(TM) series helps address vacuum and abatement demands for advanced semiconductor processing at 60 nm and smaller design rules. It offers range of turnkey, process-centric exhaust management solutions for semiconductor manufacturing. Featuring completely integrated components, product range provides full internal distribution as well as regulation and monitoring of all services.

Abatement System suits solar cell, flat panel manufacturing.

Edwards Vacuum Technology    Wilmington, MA 01887
Oct 30, 2009 Featuring integrated wet scrubbing system, Spectra ZW is used for abating deposition and clean gases used in high gas flow chemical vapor deposition process steps in solar and flat panel manufacturing. High-flow particulate and acid gas capture and processing are provided in one standalone system, which can also be integrated into Zenith for custom-built abatement and vacuum pump design. Greater than 99.5% of silica powder produced during abatement process is captured by system.

Abatement System features microwave plasma and wet scrubber.

Edwards Vacuum Technology    Wilmington, MA 01887
Jun 17, 2008 Addressing gas abatement challenges arising from dielectric and polysilicon etch processes used in semiconductor manufacturing, Sirius(TM) 6000 system reduces fab greenhouse gas emissions by 95% over wide range of total flow rates and perfluorocompound (PFC) concentrations. High-density plasma delivers more energy to abatement process, reduces PFC gases to hydrogen fluoride (HF), and prevents creation of harmful by-products, such as carbon tetrafluoride (CF4).

Vacuum Pump suits new semiconductor manufacturing processes.

Edwards Vacuum Technology    Wilmington, MA 01887
Feb 26, 2008 Featuring modular design, iXH series of vacuum pumps meets increasing demands of emerging processes required for semiconductor manufacturing at 60 nm and smaller design rules. Gas Buster(TM) inlet purge helps deal with process byproducts and minimize system maintenance and Active Utility Control (AUC) includes idle mode for periods when pump is not in use. Pump mechanism can handle hydrogen and also withstands corrosive effects of ammonia.

Turbomolecular Pump targets laboratory vacuum systems.

Edwards Vacuum Technology    Wilmington, MA 01887
Feb 01, 2008 Combining turbomolecular and drag stages with fluid dynamic stage, EXT406PX allows customers to build compact vacuum systems capable of withstanding high backing pressures even with continuous gas loads at main inlet. It can sustain normal operation at backing pressure of up to 17 mbar and has protection against mains variation on backing pump. System is available in 2 ranges: ISO and CF 160 with nitrogen pumping speeds of 400 L/sec and ISO and CF 100 with pumping speeds of 310 L/sec.

Dry Vacuum Pump System suits degassing of steel alloys.

Edwards Vacuum Technology    Wilmington, MA 01887
Dec 27, 2007 Facilitating maintenance, cleaning, and waste disposal, oil-free Dry Pumping System consists of HV30000, SN7000, and IDX1000 pumps arranged in 3 stages, pre-mounted, piped, and fully wired on 2-part skid. Each skid is nominally capable of vacuum degassing 23 tons of steel, so numerous skids can be mounted in parallel and integrated with steel degassing tank to suit required ladle sizes, typically up to 160 tons or more.

Exhaust Management Systems feature idle mode.

Edwards Vacuum Technology    Wilmington, MA 01887
Dec 26, 2007 ATLAS(TM) and TPU families of combustion exhaust management systems are available with idle mode that allows abatement systems to go into standby mode with reduced fuel and water consumption when exhaust is not flowing from attached process equipment. Available with 1-6 inlets, ATLAS systems provide exhaust management for CVD and etch processes (PECVD, HDPCVD, and WCVD), and are suited for treating exhaust streams containing fluorine (PFCs), SiH4, TEOS, WF6, and NH3.