Plasma-Therm Dry Etching Workshop Promotes Collaboration and Advances Research |
Plasma-Therm, LLC
10050 16th St. N.
St. Petersburg, FL, 33716
USA
Press release date: August 9, 2011
Training Offers Continuing Education for Students, Professors and Industry Professionals.
St. Petersburg, Florida, August 9, 2011 - At a workshop held at the Center for Nanoscale Systems (CNS) at Harvard University, researchers from academia and industry received training in device and material processing utilizing plasma dry etching. The event was organized and sponsored by Plasma-Therm, a U.S. manufacturer of advanced plasma processing equipment. CNS also played a role in managing local logistics; its location at Harvard University in Cambridge, Massachusetts made it an ideal venue given the easy access to nearby universities and technology companies.
Topics discussed included the fundamentals of plasma etching, plasma reactor systems, understanding etching mechanisms, state-of-the-art deep Si etch technology, end-point detecting techniques, as well as leading edge processes of III-V compound semiconductors, dielectric materials, and metals etching. Over 50 guests, consisting of students, professors and professionals in the semiconductor industry, attended the workshop. In addition to members of Harvard, representatives of several colleges were in attendance, such as MIT, Northeastern University, Boston College, Brown University, Tufts, and Boston University. Multiple companies in the Boston technology corridor also attended.
"I think that the workshop is a fantastic event; it provides a good introduction to those who are thinking of trying dry etch processes but who are not acquainted with these techniques or their values," said Evelyn Hu, Gordon McKay Professor of Applied Physics and Electrical Engineering at Harvard's School of Engineering and Applied Sciences. "It also gives those who are already using the techniques greater insights into the processes and how they might be further optimized for their uses. I think that such information and interaction with the users delineates the true value of an equipment provider; not only providing the instrument, but also the expertise and knowledge to best use the instrument for particular purposes."
"Plasma-Therm is committed to educating its customers and partners by providing leading technology; this workshop is an extension of our comprehensive training programs. Working with leading research institutions is especially rewarding as the interaction strengthens the connections between R&D and applications," said Dr. David Lishan, Principal Scientist and Director of Technical Marketing and one of the instructors for the workshop. "It helps Plasma-Therm stay engaged and aware of the latest developments in a wide range of fields using plasma processing, and helps transfer Plasma-Therm expertise to those exploring the boundaries of research."
About the Center for Nanoscale Systems (CNS) at Harvard
CNS is a member of the National Science Foundation's (NSF) National Nanotechnology Infrastructure Network (NNIN) initiative that created a national network of world-class facilities available to support both Harvard faculty research groups and the larger community of external users from academia and industry. The CNS provides collaborative research environment fostering leading-edge, multi-disciplinary research and education in the areas of imaging and nanoscale systems.
About Plasma-Therm
Plasma-Therm is a U.S. manufacturer of advanced plasma processing equipment focusing on specialty semiconductor markets including solid state lighting, data storage, renewable energy, MEMS, nanotechnology and compound semiconductor. Through a variety of configurations, their systems are used for etching and deposition applications. With sales and service locations throughout North America, Europe and Asia-Pacific Plasma-Therm meets the diverse needs of their global customer base.
|
|
|
|
|
|
|
|
|
|
|
| 
