Cornell University CNF Hosts Plasma-Therm Technical Workshop
10050 16th St. N.
St. Petersburg, FL, 33716
Press release date: September 4, 2012
Over 100 Engineers and Researchers from Industry and Academia
St. Petersburg, Florida - Plasma-Therm has provided an advanced plasma processing workshop at Cornell University Nanofacility (CNF). Presentations addressed both fundamental and advanced plasma etching and deposition technologies used primarily in semiconductor device fabrication and materials science research. The Cornell facility, part of NNIN (National Nanofabrication Infrastructure Network), provides resources for over 700 users and attracts researchers from throughout the world. Many attendees were graduate students and post-doctoral researchers from six different universities and researchers from over 15 companies from start-ups to Fortune 500 were present. Attendees are involved in projects requiring process capability spanning a broad range of cutting edge research topics as diverse as biosensors, data storage, micro power generation, and neural interfaces. Plasma-Therm, a leading semiconductor plasma processing equipment supplier, has held similar full day workshops throughout the world at leading institutions such as UC Berkeley, Harvard, UC Los Angeles, Notre Dame, Univ. of S. Florida, Lund (Sweden), and IMRE (Singapore).
Dr. Shankar Radhakrishnan, Sr. Engineer at Agiltron, Inc. expressed his thoughts on the workshop, "I commend Plasma-Therm on a well-organized, very useful session covering the basics of plasma processing and for delving quite a bit into detail about etch and deposition processes. Although I've been involved with process development for over 10 years, I found this workshop particularly useful as it gave me a formal understanding of the processes I routinely use from a very applied perspective. It was a well thought-out schedule. I look forward to viewing the presentation slides and to incorporating concepts I have learned in future process development efforts." Dr. Chris Thomas, CTO at Widetronix, Inc., continued that "It is rare to find, in one sitting, such a global overview of etching and film deposition. Dr. David Lishan is very knowledgeable about the topics covered in the workshop, but it was the organization and method of delivery that made the workshop most effective. The presentations stripped the information to the core essentials that allow you to walk away with a better intuitive sense of the topics. This talk should be mandatory for all facility users whether they are experienced or new to processing."
"We get immediate feedback that the workshops increase understanding of these complex and critical plasma processes. It increases productivity and helps generate new ideas for the end users as well as help Plasma-Therm maintaining close ties with the latest directions in research and the technical community." explained Dr. David Lishan, Plasma-Therm Principal Scientist and organizer of the workshop series. He continued, "It is particularly rewarding to work with graduate students and those new to the concepts and details of plasma etching and deposition. Being able to accelerate the learning processing across a broad range of technologies in a multidisciplinary environment helps Plasma-Therm establish long lasting relationships with individuals, institutions, and companies. We look forward to upcoming workshops at Stanford, UC Santa Barbara, UT Austin and the Institute of Semiconductors at the Chinese Academy of Sciences."
About Cornell NanoScale Science & Technology Facility (CNF)
The Cornell NanoScale Science & Technology Facility is a national user facility that supports a broad range of nanoscale science and technology projects by providing state-of-the-art resources coupled with expert staff support. 2012 marks our 35th year in operation. Research at CNF encompasses physical sciences, engineering, and life sciences, and has a strong inter-disciplinary emphasis. Each year over 700 researchers from academia, industry, and government laboratories (50% of whom come from outside Cornell) use the fabrication, synthesis, computation, characterization, and integration resources of CNF to build structures, devices, and systems from atomic to complex length-scales. CNF, open 24 hours a day, provides an interactive and exciting learning and practicing environment along with strong staff support that is critical to successful cutting-edge research.
Established in 1974, Plasma-Therm is a U.S. manufacturer of advanced plasma processing equipment focusing on research and development systems to high volume production in specialty semiconductor markets including solid state lighting, power, data storage, renewable energy, MEMS, nanotechnology, photonics, and wireless communication. They offer leading etching and deposition technologies and solutions for these markets. Sales and service locations throughout North America, Europe and Asia-Pacific, meet the diverse needs of Plasma-Therm's global customer base. For further information please visit www.plasmatherm.com.