RBP Chemical Technology, Inc.
Milwaukee, WI 53214 0069
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Defoamer minimizes foam generated in spray equipment.
ANTIFOAM AR-301 LF is a blended, non-silicone organic defoamer that is effective in acidic chemistry solutions such as tin strippers. It is dispersible in water and does not form oil slick. Product can be used in temperatures of 80-130Ã-
Read More »Single-Step Press Wash fights calcium buildup.
Used either by hand or in automatic washers, CAL SOLV calcium deglazing press wash removes calcium and ink contaminants on rollers and blankets in one application. It eliminates need for calcium deglazing supplemental products, and formula can be emulsified with water.
Read More »Solder-Mask Remover breaks down mask for rinsing.
MAGNASTRIP 500 removes fully-cured, liquid photoimageable, acrylic-based masks from printed circuit boards. It works quickly, completely removing mask with no attack on circuitry or laminate. Product is effective on such masks as Coates Imagecure, Enthone DSR-3241, DSR-3242 Q, Vantico Probimer 77, Taiyo, and Electra LPI.
Read More »Aqueous Developer Concentrate suits feed and bleed systems.
One-part DR-503 CX is for both make-up and replenishment in feed and bleed systems. High-loading formula includes agents that ensure straight sidewalls, help clean foot of underdeveloped polymer, and keep equipment clean. Buffering agent helps maintain pH. Concentrate is also suited for developing aqueous photoimageable solder masks and other situations where carbonate is being used, eliminating...
Read More »CTP Fountain Concentrate provides continuous fast starts.
UNITROLÃ-® CTP I one-step, low VOC concentrate is designed for presses running at greater than 2,200 fpm. It contains agents that help eliminate feedback and flashing problems that can occur at high speeds on presses with duotrol or continuous dampening systems. Product contains agents to control ink and water balance and chelators to prevent calcium glazing, while also preventing toning and...
Read More »Cleaner/Degreaser suits metal finishing applications.
SILCLEAN NS low VOC, alkaline cleaner/degreaser contains no SARA Title III, Section 313 reportable chemicals or chlorinated solvents. It cleans and suspends dirt and oils from silicone wafers and metal substrates. Product contains corrosion inhibitors, degreasers, and wetting agents to emulsify oils. It is easy to rinse and leaves no film or residue. Non-hazardous, non-combustible cleaner can...
Read More »Developer/Replenisher prevents formation of scale.
One-step Type DR-502CX aqueous developer concentrate contains cleaning agents that prevent hard water deposits. It is formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. DR-502CX provides alternative for solder mask developing applications where there is high consumption.
Read More »Neutral Concentrate provides clean, sharp print quality.
AQUA SERIES 960 PD single-step, low VOC, neutral fountain concentrate provides 4-color reproduction with bright, dense colors. Able to provide startups and restarts on newspaper presses, it is effective at low dosages and contains no SARA Title III, Section 313 reportable chemicals. Compatible with brush, spray, and conventional dampening systems, it helps control biological growth and provides...
Read More »Tin Etch Resist suits tank or flood systems.
TINCOTE 333 immersion tin etch resist replaces electroplated tin or tin/lead in Chemelex line of printed circuit chemistry. It produces flat, uniform deposit thickness, and may be replenished with tin and stabilizer components TINCOTE 333-S and TINCOTE 333-T.
Read More »Resist Stripper cleans tight spaces.
Type SR-301CM removes dry-film resist particles from spaces smaller than 2 mil and cleans stains from ferrous and non-ferrous metals in one step. It also removes over-cured photoresist and eliminates redeposition of resist particles. Stripper contains no glycol-ether solvents or SARA Title III, Section 313 reportable chemicals. It contains copper brighteners and anti-tarnish agents that produce...
Read More »Defoamer minimizes foam generated in spray equipment.
ANTIFOAM AR-301 LF is a blended, non-silicone organic defoamer that is effective in acidic chemistry solutions such as tin strippers. It is dispersible in water and does not form oil slick. Product can be used in temperatures of 80-130Ã-
Read More »Single-Step Press Wash fights calcium buildup.
Used either by hand or in automatic washers, CAL SOLV calcium deglazing press wash removes calcium and ink contaminants on rollers and blankets in one application. It eliminates need for calcium deglazing supplemental products, and formula can be emulsified with water.
Read More »Solder-Mask Remover breaks down mask for rinsing.
MAGNASTRIP 500 removes fully-cured, liquid photoimageable, acrylic-based masks from printed circuit boards. It works quickly, completely removing mask with no attack on circuitry or laminate. Product is effective on such masks as Coates Imagecure, Enthone DSR-3241, DSR-3242 Q, Vantico Probimer 77, Taiyo, and Electra LPI.
Read More »Aqueous Developer Concentrate suits feed and bleed systems.
One-part DR-503 CX is for both make-up and replenishment in feed and bleed systems. High-loading formula includes agents that ensure straight sidewalls, help clean foot of underdeveloped polymer, and keep equipment clean. Buffering agent helps maintain pH. Concentrate is also suited for developing aqueous photoimageable solder masks and other situations where carbonate is being used, eliminating...
Read More »CTP Fountain Concentrate provides continuous fast starts.
UNITROLÃ-® CTP I one-step, low VOC concentrate is designed for presses running at greater than 2,200 fpm. It contains agents that help eliminate feedback and flashing problems that can occur at high speeds on presses with duotrol or continuous dampening systems. Product contains agents to control ink and water balance and chelators to prevent calcium glazing, while also preventing toning and...
Read More »Cleaner/Degreaser suits metal finishing applications.
SILCLEAN NS low VOC, alkaline cleaner/degreaser contains no SARA Title III, Section 313 reportable chemicals or chlorinated solvents. It cleans and suspends dirt and oils from silicone wafers and metal substrates. Product contains corrosion inhibitors, degreasers, and wetting agents to emulsify oils. It is easy to rinse and leaves no film or residue. Non-hazardous, non-combustible cleaner can...
Read More »Developer/Replenisher prevents formation of scale.
One-step Type DR-502CX aqueous developer concentrate contains cleaning agents that prevent hard water deposits. It is formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. DR-502CX provides alternative for solder mask developing applications where there is high consumption.
Read More »Neutral Concentrate provides clean, sharp print quality.
AQUA SERIES 960 PD single-step, low VOC, neutral fountain concentrate provides 4-color reproduction with bright, dense colors. Able to provide startups and restarts on newspaper presses, it is effective at low dosages and contains no SARA Title III, Section 313 reportable chemicals. Compatible with brush, spray, and conventional dampening systems, it helps control biological growth and provides...
Read More »Tin Etch Resist suits tank or flood systems.
TINCOTE 333 immersion tin etch resist replaces electroplated tin or tin/lead in Chemelex line of printed circuit chemistry. It produces flat, uniform deposit thickness, and may be replenished with tin and stabilizer components TINCOTE 333-S and TINCOTE 333-T.
Read More »Resist Stripper cleans tight spaces.
Type SR-301CM removes dry-film resist particles from spaces smaller than 2 mil and cleans stains from ferrous and non-ferrous metals in one step. It also removes over-cured photoresist and eliminates redeposition of resist particles. Stripper contains no glycol-ether solvents or SARA Title III, Section 313 reportable chemicals. It contains copper brighteners and anti-tarnish agents that produce...
Read More »