Edwards Vacuum Technology
Suite 3-101E, Highwood Office Park
Tewksbury, MA 01876
Exhaust Management Systems use vacuum and abatement technologies.
Incorporating iXH harsh process vacuum pump and Atlas(TM) gas abatement solutions, Zenith(TM) series helps address vacuum and abatement demands for advanced semiconductor processing at 60 nm and smaller design rules. It offers range of turnkey, process-centric exhaust management solutions for semiconductor manufacturing. Featuring completely integrated components, product range provides full...
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Vacuum Pump suits new semiconductor manufacturing processes.
Featuring modular design, iXH series of vacuum pumps meets increasing demands of emerging processes required for semiconductor manufacturing at 60 nm and smaller design rules. Gas Buster(TM) inlet purge helps deal with process byproducts and minimize system maintenance and Active Utility Control (AUC) includes idle mode for periods when pump is not in use. Pump mechanism can handle hydrogen and...
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Turbomolecular Pump targets laboratory vacuum systems.
Combining turbomolecular and drag stages with fluid dynamic stage, EXT406PX allows customers to build compact vacuum systems capable of withstanding high backing pressures even with continuous gas loads at main inlet. It can sustain normal operation at backing pressure of up to 17 mbar and has protection against mains variation on backing pump. System is available in 2 ranges: ISO and CF 160 with...
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Dry Pumps handle wide range of flammable vapors.
ATEX-compliant CPH(TM) chemical dry pump series operates from atmospheric pressure down to less than 0.5 mbar. Model CPH250 features 250 mÃ-³/hr throughput and model CPH400 offers 400 mÃ-³/hr capacity. They are also available as pre-engineered pump and booster combinations with EH mechanical boosters, providing compact package with pumping speeds up to 2,700 mÃ-³/hr.
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Diffusion Pump targets light- and heavy-duty industry.
Model HT20B(TM) provides throughput of up to 19 mbar ls-1 for nitrogen, and features pumping speed of up to 8,000 ls-1. Boiling assembly and machined, cast aluminum interior enable system to be maintained between oil changes, and sight glass allows operators to check oil level whether pump is running or not. It has 3 power modes to reduce power consumption when pump is on standby or lightly...
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Abatement System suits compound semiconductor processes.
Featuring 6-inlet head, combustion-based Spectra-G(TM) is capable of treating all exhaust gases generated by MOCVD production tools and uses exhaust gas itself as primary fuel source. High velocity air flow transports heat and combustion products out of system, completely eliminating need for water and treatment facilities. Oxide particles can be removed from air stream by filtering or central...
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Gas Abatement Solution aids in semiconductor processing.
Based on inward-fired combustion technology, HELIOS 6(TM) gas abatement solution has head design with 6 inlets for process gases and one inlet for gas box purges or other ancillary operations. Unit does not require compressed air and can reduce hydrogen concentrations below lower explosive limit (LEL) in flows as high as 200 slm. Applications include high hydrogen flow processes, such as Si and...
Read More »BOC Edwards and Aviza Technology Announce Joint Development Agreement for Atomic Layer Deposition
JDA Combines BOC Edwards' Expertise in Chemical Precursor Formulation with Aviza's ALD Hardware Technology to Enhance Utilization, Throughput and Reduce Process Cost WILMINGTON, MASS. and SCOTTS VALLEY, CALIF. (30 October 2006)-BOC Edwards, a leading supplier of technology, equipment and support services to the electronics and microelectronics industries, and Aviza Technology, Inc. (NASDAQ:...
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BOC Edwards Installs Innovative ERIX Water Treatment System at UAlbany Nanocollege's Albany Nanotech Complex
ERIX recycles scrubber water and improves efficiency of back-pad treatment facilities WILMINGTON, MASS, US. (08 September 2006)- BOC Edwards, a leading supplier of vacuum, abatement, chemical management equipment and services to the world's semiconductor OEMs and fabs, announced today that it has successfully installed its innovative ERIX wastewater treatment system at the College of Nanoscale...
Read More »Evaporation Source is used in OLED and solar cell production.
Offering control of temperature profile and deposition rate, evaporation source is available in 2 sizes with 2 or 4 cc charge capacity. It contains heating element, temperature sensor, and interchangeable crucible and is operated by single- or 4-channel source controller that uses temperature ramps and self-tuning control loops to allow user-defined source temperature profile. Controllers operate...
Read More »Edwards Responds to United Nationsâ™ New Greenhouse Gas Guidelines
More stringent IPCC guidelines include accounting for CF4 by-product formation and emissions. Burgess Hill, West Sussex, U.K. (29 May 2019) – The Intergovernmental Panel on Climate Change (IPCC), the United Nations’ body for assessing the science related to climate change, has just released the latest refinement to its 2006 Guidelines. As part of an effort to tackle climate change, the...
Read More »Latest Abatement System Installation Marks a Milestone of Success for Edwards
Edwards now has 10,000 inward fired combustion abatement systems installed in semiconductor fabs worldwide; its abatement solutions have prevented over 14 million tons of carbon dioxide equivalent emissions from being released into the atmosphere in 2017. SAN FRANCISCO – SEMICON West (11 July 2018) – Edwards Vacuum, a leading manufacturer of vacuum and abatement solutions, announces a...
Read More »Edwards Vacuum Breaks Ground on New High-Technology Innovation Center in Hillsboro
New center is strategically located close to key semiconductor customer sites for enhanced technology collaboration & development HILLSBORO, Ore. (16 April 2018) – Edwards Vacuum, a leading manufacturer of vacuum and abatement solutions, following completion of the purchase of an eight-acre site located on NE Century Boulevard in Hillsboro, Ore., has begun the process of construction for a new...
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Exhaust Management Systems use vacuum and abatement technologies.
Incorporating iXH harsh process vacuum pump and Atlas(TM) gas abatement solutions, Zenith(TM) series helps address vacuum and abatement demands for advanced semiconductor processing at 60 nm and smaller design rules. It offers range of turnkey, process-centric exhaust management solutions for semiconductor manufacturing. Featuring completely integrated components, product range provides full...
Read More »Edwards Hires New Operations and Technology Director, Ron Krisanda
CRAWLEY, WEST SUSSEX, UK. (January 19, 2009)-Edwards, a leading global supplier of vacuum and abatement equipment and services, announced today the appointment of Ron Krisanda as operations and technology director, effective January 15, 2009. Krisanda joins Edwards from Tyco International, where he was president of the Fire and Security business for Europe, Middle East and Africa. Prior to that,...
Read More »New Industrial Service Center, Strongsville, Ohio for Stokes and Edwards Vacuum Pumps
Edwards, the leading manufacturer of vacuum equipment, has expanded its Industrial Service Center located in Strongsville, Ohio. This has been part of the company's commitment to continuously improve upon customer service, and expand support for its popular Stokes Microvac product line. The modern facility has the capacity to service the full range of Stokes and Edwards vacuum pumps, as well as...
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Vacuum Pump suits new semiconductor manufacturing processes.
Featuring modular design, iXH series of vacuum pumps meets increasing demands of emerging processes required for semiconductor manufacturing at 60 nm and smaller design rules. Gas Buster(TM) inlet purge helps deal with process byproducts and minimize system maintenance and Active Utility Control (AUC) includes idle mode for periods when pump is not in use. Pump mechanism can handle hydrogen and...
Read More »
Turbomolecular Pump targets laboratory vacuum systems.
Combining turbomolecular and drag stages with fluid dynamic stage, EXT406PX allows customers to build compact vacuum systems capable of withstanding high backing pressures even with continuous gas loads at main inlet. It can sustain normal operation at backing pressure of up to 17 mbar and has protection against mains variation on backing pump. System is available in 2 ranges: ISO and CF 160 with...
Read More »Edwards Announces Sale of Kachina Division to Applied Materials
Wilmington, Mass., Aug 28 - BOC Edwards, Inc. has signed a definitive agreement under which Edwards will divest the majority of its parts cleaning and chamber process kit management division, Kachina, to Applied Materials, Inc. (Nasdaq: AMAT) subject to a number of closing conditions. Applied Materials will acquire the assets and operations of the Kachina parts cleaning hub facilities in Arizona,...
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Dry Pumps handle wide range of flammable vapors.
ATEX-compliant CPH(TM) chemical dry pump series operates from atmospheric pressure down to less than 0.5 mbar. Model CPH250 features 250 mÃ-³/hr throughput and model CPH400 offers 400 mÃ-³/hr capacity. They are also available as pre-engineered pump and booster combinations with EH mechanical boosters, providing compact package with pumping speeds up to 2,700 mÃ-³/hr.
Read More »