Company News

Edwards Vacuum Technology

1 Highwood Dr., Tewksbury, MA, 01876, US

  • 978-658-5410
  • 800-848-9800

Public Relations:
Sandy Fewkes
MindWrite Communications, Inc.
Phone: 408-224-4024
E-mail this person

General Information:
Miles Firth
Phone: 44-0-1293-603451
E-mail this person

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Latest New Product News from
Edwards Vacuum Technology

Fluid & Gas Flow Equipment, Chemical Processing & Waste Management

Turbomolecular Vacuum Pump prevents powder deposition.

February 24, 2014

Pairing rotor with iXA Series on-board controller, Model STP-iXA4506 maximizes allowable gas throughput for high-flow processes. Absence of mechanical bearings virtually eliminates periodic maintenance. Operating at speeds up to 4,300 l/s N2 with throughput up to 4,330 sccm N2, pump is suitable for semiconductor etch, LCD etch, glass coating, solar PVD, and coating PVD applications. When needed, thermal management system can be added to minimize accumulation of deposits and particulates. Read More

Fluid & Gas Flow Equipment, Chemical Processing & Waste Management

Dry Screw Vacuum Pumps handle large gas volumes.

February 7, 2012

With ultimate vacuum typically down to 3.8 x 10-4 Torr without purge, Models GXS450 and GXS750 deliver peak pumping speeds up to 435 cfm. When combined with booster pump, units offer speeds up to 1,978 cfm. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, which removes need to partially strip pump. Fitted with controller as standard, pumps are suited for steel degassing and metallurgy processes, glass coating, solar coating, and LED manufacture. Read More

Fluid & Gas Flow Equipment, Chemical Processing & Waste Management, Green & Clean

Dry Vacuum Pumps feature tapered screw technology.

October 21, 2011

Suited for liquid and solids handling in chemical, petrochemical, and pharmaceutical processes, CXS Pumps offer vacuum down to 10-3 mbar with no contamination of process stream or cooling water and no effluent generation. Tapered screw technology gives smooth, gradual compression along length of rotor for optimized pumping at all inlet pressures. Independently certified for hazardous environments, units can pump up to 1 L of liquid/min continuously and up to 25 L slugs without stopping. Read More

Fluid & Gas Flow Equipment, Chemical Processing & Waste Management

Dry Screw Vacuum Pumps are virtually maintenance-free.

July 7, 2010

Providing vacuum down to 1 x 10-3 mbar, GXS Series features service life up to 5 years, even in harsh applications. Pump mechanism can be cleaned using high flow purge and solvent flush accessory, eliminating need to partially strip pump. Shafts are supported at both ends, resulting in optimized dust handling, minimized vibration, and noise levels below 64 dB(A). Applications include lamination, coating, metallurgy, pharmaceutical and food process freeze drying, and packaging. Read More

HVAC, Machinery & Machining Tools

Exhaust Management Systems use vacuum and abatement technologies.

March 19, 2010

Incorporating iXH harsh process vacuum pump and Atlas(TM) gas abatement solutions, Zenith(TM) series helps address vacuum and abatement demands for advanced semiconductor processing at 60 nm and smaller design rules. It offers range of turnkey, process-centric exhaust management solutions for semiconductor manufacturing. Featuring completely integrated components, product range provides full internal distribution as well as regulation and monitoring of all services. Read More

Green & Clean, Waste Handling Equipment, HVAC

Abatement System suits solar cell, flat panel manufacturing.

October 30, 2009

Featuring integrated wet scrubbing system, Spectra ZW is used for abating deposition and clean gases used in high gas flow chemical vapor deposition process steps in solar and flat panel manufacturing. High-flow particulate and acid gas capture and processing are provided in one standalone system, which can also be integrated into Zenith for custom-built abatement and vacuum pump design. Greater than 99.5% of silica powder produced during abatement process is captured by system. Read More

Machinery & Machining Tools, Cleaning Products & Equipment

Abatement System features microwave plasma and wet scrubber.

June 17, 2008

Addressing gas abatement challenges arising from dielectric and polysilicon etch processes used in semiconductor manufacturing, Sirius(TM) 6000 system reduces fab greenhouse gas emissions by 95% over wide range of total flow rates and perfluorocompound (PFC) concentrations. High-density plasma delivers more energy to abatement process, reduces PFC gases to hydrogen fluoride (HF), and prevents creation of harmful by-products, such as carbon tetrafluoride (CF4). Read More

Fluid & Gas Flow Equipment, Chemical Processing & Waste Management

Vacuum Pump suits new semiconductor manufacturing processes.

February 26, 2008

Featuring modular design, iXH series of vacuum pumps meets increasing demands of emerging processes required for semiconductor manufacturing at 60 nm and smaller design rules. Gas Buster(TM) inlet purge helps deal with process byproducts and minimize system maintenance and Active Utility Control (AUC) includes idle mode for periods when pump is not in use. Pump mechanism can handle hydrogen and also withstands corrosive effects of ammonia. Read More

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Edwards Vacuum Technology