RENA Technologies North America, LLC

MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process
Computer Hardware & Peripherals

MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process

ALBANY, Ore.- – MEI Wet Processing Systems and Services announced today their receipt of a patent from the US Patent Office for one of their targeted semiconductor processing applications. This patent protects MEI's unique metal liftoff process which was trademarked earlier under the name FluidJet™. The U.S. Patent No. 9,070,631 describes a new approach to providing metal liftoff by defining...

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MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process
Computer Hardware & Peripherals

MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process

ALBANY, Ore.Â- – MEI Wet Processing Systems and Services announced today their receipt of a patent from the US Patent Office for one of their targeted semiconductor processing applications. This patent protects MEI's unique metal liftoff process which was trademarked earlier under the name FluidJet™. The U.S. Patent No. 9,070,631 describes a new approach to providing metal liftoff by...

Read More »
Fluid & Gas Flow Equipment

Spin Rinse Dryer for Cassettes reduces nitrogen use.

Intended for semiconductor processing, Compass SRD enables accelerated drying of wafers. IDX Flexware™ Process Control Software, included,- enables host communication and factory automation. With recipe download and remote access, dryer increases usability and facilitates process control. Also, process controls allow capture of process data for line analysis.

Read More »
Fluid & Gas Flow Equipment

Spin Rinse Dryer for Cassettes reduces nitrogen use.

Intended for semiconductor processing, Compass SRD enables accelerated drying of wafers. IDX Flexware™ Process Control Software, included,Â- enables host communication and factory automation. With recipe download and remote access, dryer increases usability and facilitates process control. Also, process controls allow capture of process data for line analysis.

Read More »
Wafer Dryer includes HCl and HF injection capability.
Fluid & Gas Flow Equipment

Wafer Dryer includes HCl and HF injection capability.

Available as option in fully automated Evolution- wet processing systems and semi-automated Revolution batch wet processing systems, Genesis Xi Marangoni Dryer enables gentle, high-purity drying of semiconductor wafers with low particle contamination. Multistep oxide or ionic cleaning eliminates air interface, producing optimized surface conditioning with no damage to photoresist. Dryer...

Read More »
Wafer Dryer includes HCl and HF injection capability.
Fluid & Gas Flow Equipment

Wafer Dryer includes HCl and HF injection capability.

Available as option in fully automated EvolutionÂ- wet processing systems and semi-automated Revolution batch wet processing systems, Genesis Xi Marangoni Dryer enables gentle, high-purity drying of semiconductor wafers with low particle contamination. Multistep oxide or ionic cleaning eliminates air interface, producing optimized surface conditioning with no damage to photoresist. Dryer...

Read More »
Metal Etch Systems produce uniform results.
Labels Tags Signage & Equipment

Metal Etch Systems produce uniform results.

Designed for compound semiconductor manufacturing, Critical Etch Systems for Au, Ag, Cu and TiW deliver optimized within-wafer, wafer-to-wafer, and batch-to-batch etch uniformity. Wet processing systems also enable consistent etching even within dense patterned areas. Field proven on 1–5 -µm features, batch immersion systems are configurable for single or combination metal etch steps over wide...

Read More »
Metal Etch Systems produce uniform results.
Labels Tags Signage & Equipment

Metal Etch Systems produce uniform results.

Designed for compound semiconductor manufacturing, Critical Etch Systems for Au, Ag, Cu and TiW deliver optimized within-wafer, wafer-to-wafer, and batch-to-batch etch uniformity. Wet processing systems also enable consistent etching even within dense patterned areas. Field proven on 1–5 Â-µm features, batch immersion systems are configurable for single or combination metal etch steps over...

Read More »
Batch Wet Processing System enhances semiconductor production.
Machinery & Machining Tools

Batch Wet Processing System enhances semiconductor production.

Used for metal liftoff in MEMS and compound semiconductor manufacturing, FluidJet™ eliminates device damage and minimizes chemical use. Gentle cleaning suits sensitive metal features and thin lines,- while use of batch immersion processing removes metals and eliminates redeposition and defects. Self-cleaning tanks and accessible metal collection baskets facilitate complete reclamation of...

Read More »
Batch Wet Processing System enhances semiconductor production.
Machinery & Machining Tools

Batch Wet Processing System enhances semiconductor production.

Used for metal liftoff in MEMS and compound semiconductor manufacturing, FluidJet™ eliminates device damage and minimizes chemical use. Gentle cleaning suits sensitive metal features and thin lines,Â- while use of batch immersion processing removes metals and eliminates redeposition and defects. Self-cleaning tanks and accessible metal collection baskets facilitate complete reclamation of...

Read More »
MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process
Computer Hardware & Peripherals

MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process

ALBANY, Ore.- – MEI Wet Processing Systems and Services announced today their receipt of a patent from the US Patent Office for one of their targeted semiconductor processing applications. This patent protects MEI's unique metal liftoff process which was trademarked earlier under the name FluidJet™. The U.S. Patent No. 9,070,631 describes a new approach to providing metal liftoff by defining...

Read More »
MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process
Computer Hardware & Peripherals

MEI Wet Processing's Patent Covers Unique, Low Cost, Batch Immersion Metal Lift-Off Process

ALBANY, Ore.Â- – MEI Wet Processing Systems and Services announced today their receipt of a patent from the US Patent Office for one of their targeted semiconductor processing applications. This patent protects MEI's unique metal liftoff process which was trademarked earlier under the name FluidJet™. The U.S. Patent No. 9,070,631 describes a new approach to providing metal liftoff by...

Read More »
Fluid & Gas Flow Equipment

Spin Rinse Dryer for Cassettes reduces nitrogen use.

Intended for semiconductor processing, Compass SRD enables accelerated drying of wafers. IDX Flexware™ Process Control Software, included,- enables host communication and factory automation. With recipe download and remote access, dryer increases usability and facilitates process control. Also, process controls allow capture of process data for line analysis.

Read More »
Fluid & Gas Flow Equipment

Spin Rinse Dryer for Cassettes reduces nitrogen use.

Intended for semiconductor processing, Compass SRD enables accelerated drying of wafers. IDX Flexware™ Process Control Software, included,Â- enables host communication and factory automation. With recipe download and remote access, dryer increases usability and facilitates process control. Also, process controls allow capture of process data for line analysis.

Read More »
Wafer Dryer includes HCl and HF injection capability.
Fluid & Gas Flow Equipment

Wafer Dryer includes HCl and HF injection capability.

Available as option in fully automated Evolution- wet processing systems and semi-automated Revolution batch wet processing systems, Genesis Xi Marangoni Dryer enables gentle, high-purity drying of semiconductor wafers with low particle contamination. Multistep oxide or ionic cleaning eliminates air interface, producing optimized surface conditioning with no damage to photoresist. Dryer...

Read More »
Wafer Dryer includes HCl and HF injection capability.
Fluid & Gas Flow Equipment

Wafer Dryer includes HCl and HF injection capability.

Available as option in fully automated EvolutionÂ- wet processing systems and semi-automated Revolution batch wet processing systems, Genesis Xi Marangoni Dryer enables gentle, high-purity drying of semiconductor wafers with low particle contamination. Multistep oxide or ionic cleaning eliminates air interface, producing optimized surface conditioning with no damage to photoresist. Dryer...

Read More »
Metal Etch Systems produce uniform results.
Labels Tags Signage & Equipment

Metal Etch Systems produce uniform results.

Designed for compound semiconductor manufacturing, Critical Etch Systems for Au, Ag, Cu and TiW deliver optimized within-wafer, wafer-to-wafer, and batch-to-batch etch uniformity. Wet processing systems also enable consistent etching even within dense patterned areas. Field proven on 1–5 -µm features, batch immersion systems are configurable for single or combination metal etch steps over wide...

Read More »
Metal Etch Systems produce uniform results.
Labels Tags Signage & Equipment

Metal Etch Systems produce uniform results.

Designed for compound semiconductor manufacturing, Critical Etch Systems for Au, Ag, Cu and TiW deliver optimized within-wafer, wafer-to-wafer, and batch-to-batch etch uniformity. Wet processing systems also enable consistent etching even within dense patterned areas. Field proven on 1–5 Â-µm features, batch immersion systems are configurable for single or combination metal etch steps over...

Read More »
Batch Wet Processing System enhances semiconductor production.
Machinery & Machining Tools

Batch Wet Processing System enhances semiconductor production.

Used for metal liftoff in MEMS and compound semiconductor manufacturing, FluidJet™ eliminates device damage and minimizes chemical use. Gentle cleaning suits sensitive metal features and thin lines,- while use of batch immersion processing removes metals and eliminates redeposition and defects. Self-cleaning tanks and accessible metal collection baskets facilitate complete reclamation of...

Read More »
Batch Wet Processing System enhances semiconductor production.
Machinery & Machining Tools

Batch Wet Processing System enhances semiconductor production.

Used for metal liftoff in MEMS and compound semiconductor manufacturing, FluidJet™ eliminates device damage and minimizes chemical use. Gentle cleaning suits sensitive metal features and thin lines,Â- while use of batch immersion processing removes metals and eliminates redeposition and defects. Self-cleaning tanks and accessible metal collection baskets facilitate complete reclamation of...

Read More »

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