Molecular Imprints, Inc.
Austin, TX 78758-3605
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Imprint Lithography Tool meets semiconductor overlay needs.
Leveraging S-FILÃ-® (Step and Flash Imprint Lithography) technology, ImprioÃ-® 300 is used for IC prototyping and process development at 32 nm node and beyond. It offers sub-10 nm resolution patterning in single exposure and can create dense, high-resolution structures in 2 dimensions. Drop-in technology - suitable for mix-and-match strategies where resolution advantage can be deployed on...
Read More »Imprint Lithography Tool meets semiconductor overlay needs.
Leveraging S-FILÃ-® (Step and Flash Imprint Lithography) technology, ImprioÃ-® 300 is used for IC prototyping and process development at 32 nm node and beyond. It offers sub-10 nm resolution patterning in single exposure and can create dense, high-resolution structures in 2 dimensions. Drop-in technology - suitable for mix-and-match strategies where resolution advantage can be deployed on...
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