MKS Instruments Inc. / UTI Division

Wafer Cleaning Solution utilizes ozonated water.

Wafer Cleaning Solution utilizes ozonated water.

LIQUOZONÂ-® Smart Ozonated Water Delivery System delivers ultra-pure ozonated water (DIO3) for wafer and substrate cleaning during integrated circuit and thin film processing. Self-contained dissolved ozone delivery system eliminates need for chemical storage, does not generate NOx, and delivers accurate dissolved ozone concentrations up to 65 ppm. Closed loop control ensures delivery at...

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Wafer Cleaning Solution utilizes ozonated water.

Wafer Cleaning Solution utilizes ozonated water.

LIQUOZONÂ-® Smart Ozonated Water Delivery System delivers ultra-pure ozonated water (DIO3) for wafer and substrate cleaning during integrated circuit and thin film processing. Self-contained dissolved ozone delivery system eliminates need for chemical storage, does not generate NOx, and delivers accurate dissolved ozone concentrations up to 65 ppm. Closed loop control ensures delivery at...

Read More »

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